The business of M.C.S.E. is related to consummables, components for deposition systems, CVD and etching equipments as well as thin film characterization.

Substrates
- Silicon, Silica, Glass
- Germanium, Sapphire.

Sputtering cathodes
- Magnetron cathodes DCM/RFM pulsed mode.
- Circular and rectangular configuration.
- Ultra and vacuum compatible.
- Specific development under following criteria :

high uniformity	high yield

www.thfc.de
www.ionx.de

High purity materials :
- Metals and alloys
- Oxydes, nitrides, carbides, fluorides.
- Intermetallic compounds.
- Hot pressed composition

For the manufacturing of :
- Evaporation charges
- Sputtering targets
- Laser ablation targets.

SERVICES :
- Bonding of target on backing plate.
- Production of backing plate.
- Crucibles for evaporation.
- Precious metal refinery.

Heating elements
Graphite
PG, Pyrolytic Graphite
PNB/PG/PBN.

Thin films

&linkeo_site.keyword1;

&linkeo_site.keyword2;

&linkeo_site.keyword3;

&linkeo_site.keyword4;

Thin films: Production of thin film layers as per customer specification using :
- Evaporation
- Sputtering.

CVD

Systems Plasma

EtCHING

- RIE SI 591

- ICP SI 500

Etching by RIE and/or ICP process from – 150°C to + 200°C (depending on option).

CVD
CVD deposition at low temperature
(< 100°C) of dieletrics materials (SiO2, Si3N4...)
SI 500, ICPECVD

Characterization
Measurement of thickness and refractive index of transparent thin films.

a/ Reflectometry FTP Advanced RM 1000-2000

b/ Ellipsometry
1/ Mono or bi wavelengths
2/ Spectroscopic from 190 nm to 2300 nm as per options
3/ In situ on deposition or etching systems
4/ Semi automatic and spectroscopic SENDURO from 290 to 850 nm
5/ Infrared Spectroscopic Sendira

For more informations about systems : www.sentech.de