The business of M.C.S.E. is related to consummables, components for deposition systems, CVD and etching equipments as well as thin film characterization.

Substrates
- Silicon, Silica, Glass
- Germanium, Sapphire.

Sputtering cathodes
- Magnetron cathodes DCM/RFM pulsed mode.
- Circular and rectangular configuration.
- Ultra and vacuum compatible.
- Specific development under following criteria :

high uniformity
high yield

www.thfc.de
www.ionx.de

High purity materials :
- Metals and alloys
- Oxydes, nitrides, carbides, fluorides.
- Intermetallic compounds.
- Hot pressed composition

For the manufacturing of :
- Evaporation charges
- Sputtering targets
- Laser ablation targets.

SERVICES :
- Bonding of target on backing plate.
- Production of backing plate.
- Crucibles for evaporation.
- Precious metal refinery.

Heating elements
Graphite
PG, Pyrolytic Graphite
PNB/PG/PBN.

Thin films

Thin films: Production of thin film layers as per customer specification using :
- Evaporation
- Sputtering.

CVD

Systems Plasma

EtCHING
- RIE SI 591
- ICP SI 500

Etching by RIE and/or ICP process from – 150°C to + 200°C (depending on option).

CVD
CVD deposition at low temperature
(< 100°C) of dieletrics materials (SiO2, Si3N4...)
SI 500, ICPECVD

Characterization
Measurement of thickness and refractive index of transparent thin films.

a/ Reflectometry
FTP Advanced
RM 1000-2000
   
b/ Ellipsometry  
1/ Mono or bi wavelengths
2/ Spectroscopic from 190 nm to 2300 nm as per options
3/ In situ
on deposition or etching systems
4/ Semi automatic and spectroscopic
SENDURO from 290 to 850 nm
5/ Infrared Spectroscopic Sendira
 sendira

For more informations about systems : www.sentech.de
MCSE - 13, rue Robert Vermassen - BP 10002 - 95111 SANNOIS CEDEX - FRANCE // Phone : 01 34 15 28 22 - Fax : 01 34 15 28 86
SARL au capital de 49000 € - RCS Pontoise B 391 183 191 - SIRET 391 183 191 000 33 - APE 7490 B
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